Semiconductor Inspection Equipment

Your Professional Semiconductor Inspection Equipment Supplier

 

Chengdu Huazhuo Semi-Equipment Co., Limited specializes in providing customized and standard equipment, production line inspection and testing equipment, as well as laboratory reliability testing and failure analysis instruments for the semiconductor chip manufacturing, packaging, and testing industries.

 
  • X–ray Fluorescence Spectrometer
    EDX1800E X-ray Fluorescence Spectrometer According to the wide application of EDX1800B in various fields, EDX1800E is specially designed for better performance and higher safety protection class....
    read more
  • X - Ray Insp E Ction Equipment
    AX9100 X - Ray Insp e ction Equipment AX9100 X - Ray Insp e ction Equipment Widely applied for BGA, CSP, Flip Chip, LED, Fuse, Diode, PCB, Semiconductor, Battery Industry, Small Metal Casting,...
    read more
 
Why Choose Us

Our Factory

We has dozens of R&D personnel and more than 500 square meters of office space.Production base: Factory area: 3600㎡ (Shenzhen) +1000㎡ (Chengdu), the number of employees: more than 120 people.

Our Service

Offer comprehensive product information, technical specifications, and insights into packaging, testing, and factory construction. Develop customized solutions in response to the unique requirements of each client.

Professional Team

The company integrates independent research and development, design, manufacturing, and after-sales service. Leveraging a team of seasoned professionals in semiconductor chip manufacturing and packaging equipment processes, the company continuously innovates and optimizes its products and services.

Production Market

Our equipment has successfully passed the ISO9000 quality certification, with annual sales reaching 150 million in the Greater China region. Additionally, our products are exported to countries such as Singapore, India, Thailand, Mexico, Malaysia, and Vietnam.

 

 

 

Types of Semiconductor Inspection Equipment

Dimensional Metrology – Ensures precise measurement of critical dimensions (CD) in semiconductor devices, maintaining strict tolerances required for transistor scaling, circuit performance, and advanced lithography processes in modern chip manufacturing.

 

Optical Metrology – Uses non-contact techniques to analyze thin-film thickness, refractive index, and surface properties, ensuring accuracy in semiconductor fabrication without damaging delicate structures.

 

Electron Microscopy – Utilizes Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) to provide high-resolution imaging, allowing engineers to inspect nanometer-scale features, defects, and material compositions in semiconductor wafers.

 

X-ray Metrology – Applies X-ray diffraction (XRD) and X-ray fluorescence (XRF) to assess crystal structures, material stresses, and element composition, essential for analyzing advanced semiconductor materials and multi-layer chip designs.

 

Electrical Metrology – Evaluates resistivity, capacitance, contact resistance, and dielectric properties to ensure optimal semiconductor performance, helping identify electrical faults in integrated circuits, transistors, and interconnects before mass production.

X–ray Fluorescence Spectrometer

 

Specification

 

Item

Model

I.C.T-9200

X-Ray Tube

Type

Transmissive Light Tube

Voltage

100kv/110kv, 200μA/300μA

Focal Spot Size

1 μm (Option 0.5 μm)

Platform

Resolution

1648*1644px

System Computer

Operating system

Windows 10

Magnification

2500x

Structure

Plate rotation angle

60°

Max. Loading Size

690*685mm

Max. Inspection Area

670*665mm

Max. Loading Weight

≤20kg

Dimension

1510*1770*1850mm

Weight

1800kg

Platform movement

Manual/Auto

 

Tools and Techniques in Semiconductor Inspection Equipment

Critical Dimension (CD) Measurement: Ensures nanoscale feature dimensions are within tolerance, using SEM and stereometry to maintain process control in advanced semiconductor manufacturing.

 

Overlay Metrology: Aligns multiple lithographic layers with sub-nanometer accuracy, preventing pattern shift defects that impact circuit performance and yield in high-volume chip production.

 

Thin-Film Measurement: Evaluates film thickness, uniformity, and optical properties using techniques like ellipsometry and X-ray reflectometry to optimize deposition processes in semiconductor fabrication.

 

Defect Inspection: Detects sub-micron defects using automated optical and electron-beam inspection, improving semiconductor yield and reducing costly failures in high-density integrated circuits.

Atomic Force Microscopy (AFM):

Provides nanoscale surface characterization by scanning with an atomic-scale probe, essential for evaluating roughness, step heights, and material properties.

Scanning Electron Microscopy (SEM):

Captures high-resolution images of semiconductor structures, enabling precise analysis of feature dimensions, defects, and material composition at the nanometer scale.

Spectroscopic Ellipsometry:

Measures refractive index, layer thickness, and material properties using polarized light, ensuring precise process control in dielectric and thin-film applications.

 

Product Paramenters

 

Main technical indicators

Operating mode

Fully Automatic

Equipment usage

2-4 inch wafer defect inspection

Wafer size

2 "wafer φ 50mm; 4 "wafer φ 100mm, thickness: 300-1100 μ m. Warpage < 0.5mm;

Crystal round box: 2 "and 4" 25 slot Cassette;

Equipment Layout

L1159mm*W780mm*H706.5mm

Passline

1040mm±20mm

Wafer feeding and receiving device

Single station+lifting module

Visual Mapping System

Visual System

Mapping

500W array camera+strip light source

Detection device

Microscope

Macroscopic inspection lamp

Halogen lamp

Cassette wafer extraction

Single wishbone module

Wafer transport

Double wishbone module

Wafer positioning mechanical

Clamping+fiber optic sensor

Front macroscopic inspection device:

Wafer lifting mechanism+wafer swing angle mechanism+wafer rotation axis

Wafer detection

Microscope+XY manual platform

Operating interface

Industrial computer+keyboard and mouse

Communication method

CC-Link IE Field Or TCP IP

Cleanliness

ISO Class 1000

Material

Aluminum/Steel

Rust proof treatment

Baking paint/Electroplating

Negative pressure interface

Φ 6 Negative pressure trachea

The negative pressure gauge value must reach -80KPa or above

Positive pressure interface

Φ 6 Positive pressure trachea

The digital pressure gauge value must reach 0.5~0.8MPa

Power interface

220V AC power supply

External power supply power ≈ 1000W

 

Cooperation Process

 

productcate-792-420

 

Packing & Delivery

 

productcate-789-513

 

FAQ

Q: Do you provide software updates?

A: For customers who buy our machine, we can offer free upgraded software for you.

Q: How can I buy machine from you?

A: (1) Consult us on line or by e-mail;
(2) Negotiate and confirm the final price, shipping, payment method and other terms;
(3) Send you the proforma invoice and confirm your order;
(4) Make the payment according to the method put on proforma invoice;
(5) We prepare your order in terms of the proforma invoice after confirming your full payment . And 100% quality check before shipping;
(6) Send your order via express or by air or by sea.

Q: How about the spare parts?

A: After we deal down all the things , we will offer you a spare parts list for your reference.

Q: What is your delivery terms?

A: We support:FOB,CFR,CIF,EXW, DDP,DDU

Q: What is the payment terms?

A: Our normal payment terms is 30%TT in advance, the balance 70%TT before shipping.

We're well-known as one of the leading semiconductor inspection equipment enterprises in China. If you're going to buy high quality semiconductor inspection equipment, welcome to get free sample from our factory. Also, customized service is available.

De cap machine, QFN product stripper